CORE EQUIP

核心设备集群

CORE EQUIPMENT

HARDWARE RESOURCES
HARDWARE RESOURCES
PLD
脉冲激光沉积系统 Pulsed Laser Deposition
PLD
利用高能量脉冲激光轰击靶材，用于高质量多铁性氧化物薄膜及超晶格的原子级外延生长。实验室共 3 套。 Utilizes high-energy pulsed laser ablation for atomic-level epitaxial growth of high-quality multiferroic oxide thin films and superlattices. Three systems are in service.
脉冲激光器
脉冲激光器 Pulsed Laser
Laser
配套 PLD 系统使用，提供薄膜沉积所需的高能量脉冲激光源。本设备由清华大学南策文院士捐赠。 Paired with the PLD system to provide the high-energy pulsed laser source for film deposition. Donated by Academician Ce-Wen Nan of Tsinghua University.
AFM
扫描探针显微镜 Scanning Probe Microscope
SPM/AFM
用于薄膜表面形貌(AFM)、压电响应(PFM)以及磁力显微镜(MFM)的高精度纳米级表征。 Used for high-precision nanoscale characterization of film surface topography (AFM), piezoresponse (PFM), and magnetic domain structures (MFM).
PPMS
综合物理性质测量系统 Physical Property Measurement System
PPMS
提供极低温与强磁场环境，用于薄膜材料的电学、磁学及热学等精密综合物性测量。 Provides ultra-low temperature and high magnetic field environments for precise comprehensive measurements of electrical, magnetic, and thermal properties.
SEM
扫描电子显微镜 Scanning Electron Microscope
SEM
利用聚焦电子束扫描样品表面，观察薄膜与异质结的微观形貌、界面及成分分布。感谢惠然科技捐赠！ Images micro-morphology, interfaces, and elemental distribution of thin films and heterostructures via a focused electron beam. Donated by WellRun Technology.
FE Tester
铁电测试仪 Ferroelectric Tester
FE Tester
测量铁电薄膜的电滞回线（P-E loop）、漏电流与疲劳特性，表征铁电极化行为。 Measures P-E hysteresis loops, leakage current, and fatigue characteristics to characterize ferroelectric polarization behavior.
Maskless UV Lithography
无掩膜紫外光刻机 Maskless UV Lithography System
UV Litho
基于无掩膜数字光刻技术，快速制备微纳图形电极与器件，支持柔性版图设计。 Digital maskless lithography for rapid fabrication of micro/nano-patterned electrodes and devices with flexible layout design.